Stellar
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Stellar Single-Wafer Plasma Enhanced Atomic Layer Deposition (PEALD) System

The Stellar 3000 is the world’s first single-wafer PEALD HVM tool, with high throughput of 40 wafers/hr, for both high-k dielectric and metal electrodes.  The main use of the Stellar is for 300mm PEALD High-k, Middle-k and Metal thin film deposition.  It also can be used for Thermal ALD,

Since its introduction at SEMICON Japan in Dec. 2006, ASMI has installed systems for RF Analog IC, CMOS Image Sensor, LCD, eDRAM, and DRAM customer sites. 

Features
  • Stand-Alone Dual Chamber PEALD
  • Precise Single-Wafer Processing
  • Choice of lateral flow, or showerhead flow designs
  • In-situ laminate film deposition
  • High-k (AlO, TaO, HfO, ZrO), Middle-k (SiO, SiN) and Metal films are available