SYNERGIS​​​® ALD

​Synergis® is a high productivity 300mm tool for a wide range of thermal ALD applications. The Synergis system can be configured with up to four Dual Chamber Modules (DCM), enabling eight chambers in high volume production, within a very compact footprint.

 

SYNERGIS BENEFITS

Synergis is a high throughput single-wafer thermal ALD tool. Its key benefits include:

  • Independent chambers for optimum single-wafer performance;
  • Low volume chamber for efficient gas purge and fast processing;
  • Precise thermal control for excellent conformality;
  • Excellent chamber-to-chamber matching for wafer-to-wafer repeatability;
  • Short preventative maintenance for high availability;
  • Low cost per wafer.

MAJOR APPLICATIONS

  • Broad conformal film portfolio for metal oxides, dielectrics, metal nitrides, pure metals;
  • Etch stops, hard masks;
  • Low resistivity, ultra-thin barrier layers;
  • Films for sealing and encapsulation; ​​​​
  • Low resistivity pure metals. ​​​​