Low Pressure Chemical Vapor Deposition & DIFFUSION - products

​Low Pressure Chemical Vapor Deposition (LPCVD) is a thermal process that deposits various films at low pressure. Diffusion (sometimes referred to as annealing) is a thermal treatment used to move dopants, or impurities, and make dopants introduced by ion implantation electrically active.

​Our Adv​ance® Series Vertical Furnaces provide a wide range of high-productivity batch processing solutions for Diffusion, Oxidation, Anneal, Cure and LPCVD. In addition, ALD capability is available for the Advance furnaces further exploiting the benefits of their batch productivity.

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