Eagle® XP8 PEALD

​​Eagle XP8 is a high-productivity 300mm tool for plasma-enhanced ALD (PEALD) applications. The Eagle XP8 PEALD system can be configured with up to four Dual Chamber Modules (DCM), enabling eight chambers in high volume production within a very compact footprint.

High productivity, compact footprint.

Major features

Eagle® XP8 is a high-productivity tool for PEALD applications which can be configured with up to four DCMs. Eagle XP8 is capable of a broad range of dielectric PEALD processes, including low-temperature spacers for multiple patterning applications. 

 

Eagle® XP8 PEALD benefits 

  • Independent chambers for optimum performance; 

  • Low volume chamber for efficient gas use and fast processing; 

  • Excellent chamber-to-chamber matching for wafer-to-wafer repeatability; 

  • Low Cost of Ownership; 

  • Easy opening chamber design for fast maintenance; 

  • Efficient energy consumption. 

 

Major applications 

  • Broad conformal film portfolio for liner, spacer, etch stop layers; 

  • Low temperature conformal film portfolio for Spacer Defined Multiple Patterning (SDMP); 

  • TSV isolation liner; 

  • Films for conformal doping. ​ 

 

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