Process Engineering Intern
Job details
Step into a career with ASM, where cutting edge technology meets collaborative culture.
For over 55 years ASM has been ahead of what’s next, at the forefront of innovation and what’s technologically possible. With more than 4,500 ASMers representing 70 nationalities, our people and our advanced semiconductor devices are playing a crucial role in trends such as 5G, cloud computing, AI, and autonomous driving. But we’re more than just a tech company. We value diversity, inclusion and sustainability as we strive to make a positive impact on the world. Our development programs help support your growth, shaping your future and pushing the boundaries of innovation to unleash potential.
We are seeking a motivated intern to support advanced metrology development activities focused on improving measurement accuracy and modeling robustness across key characterization techniques. This role is ideal for candidates interested in semiconductor process characterization, data analysis, and design of experiments (DOE) methodology.
What you will be working on
The intern will work with the Process Engineering and Metrology teams to:
1. Transmission Electron Microscopy (TEM) Variability & Error Modeling
• Characterize sample to sample and region to region variability in TEM measurements.
• Quantify measurement uncertainty and establish statistically meaningful error bars.
• Translate TEM measurement error into corresponding DOE model error.
• Assess how measurement uncertainty impacts p values, model significance, and predictive validity.
• Propose methods to reduce overall model noise—either through measurement improvements or smarter experimental design.
2. Ellipsometry Modeling and Material Optical Properties (n, k)
• Support extraction and optimization of refractive index (n) and extinction coefficient (k) for new films.
• Analyze how ellipsometry model assumptions impact derived film thickness and composition.
• Investigate thickness dependent behavior: identify thresholds where goodness of fit (GoF) degrades as thickness increases.
• Evaluate breakdown mechanisms (e.g., over simplified dispersion models, depolarization effects, parameter cross correlation).
3. DOE Data Integration & Improvement
• Combine metrology data streams (TEM, ellipsometry) to build more realistic input distributions for DOE.
• Quantify how measurement error propagates into model confidence levels and sensitivity indices.
• Recommend approaches to improve DOE outcomes (e.g., reduced uncertainty, alternative sampling plans, model weighting).
4. Deliverables
By the end of the internship, the student is expected to deliver:
• A quantified error propagation framework linking key metrology tools to DOE output quality.
• A statistical report detailing major sources of measurement uncertainty and recommended mitigation paths.
• Updated ellipsometry models (n, k, dispersion) or parameter sets that improve GoF for thick films.
• A final technical presentation summarizing findings, insights, and process improvement opportunities.
What we are looking for
• Working towards his doctoral degree with focus on Physics, chemistry or material science. Other engineering disciplines might be considered.
Apply today to be part of what’s next.
We make the tech that enables the chips in devices which improve lives around the world. We do this with an eye to the future, pushing the boundaries of what’s possible through cutting-edge innovation, and driving the next wave of technological breakthroughs that shape how we live, work, and connect.
To learn more about ASM, find us at asm.com and on LinkedIn, Facebook, Instagram, X and YouTube.
ASM is an equal opportunity employer and considers qualified applicants for employment without regard to race, color, religion, age, nationality, social or ethnic origin, sexual orientation, gender, gender identify or expression, marital status, pregnancy, political affiliation, disability, genetic information, veteran status, or any other characteristic protected by law.