Silicon carbide

Process equipment for epitaxial deposition of silicon carbide (SiC) is a fast-growing market, mostly due to the material’s benefits for electric vehicles. With our history in epitaxy equipment, this is a natural fit for our line-up.

About silicon carbide

Moving right along

The SiC epitaxy equipment market is growing fast due to the growing electrification of the automotive industry, with vehicle-power electronics transitioning from silicon to SiC-based materials. SiC devices allow electric vehicles to have longer battery life and a greater range.

High efficiency

Our SiC tools use an epitaxy process to deposit the SiC materials, either on bare substrates or as part of the transistor device fabrication process. Because of its wide band gap, SiC is highly efficient at high voltages, offering higher power efficiency and increased power density, resulting in reduced component weight and size and faster battery-charging times. 

Curious how the PE2O8™ is enabling the energy revolution? Watch our tech explainer video.

Our products

In 2023, we completed integrating our new SiC team. We’ve solidified our position in the SiC epitaxy market, it’s now our fastest-growing product line.

PE1O6A / PE1O8

Our PE1O6A and PE1O8 silicon carbide (SiC) tools use an epitaxy process to deposit the SiC materials on either bare wafers or as part of the transistor device fabrication process.

PE1O6A / PE1O8

PE2O8™

The PE2O8™ silicon carbide (SiC) tool uses an epitaxy process to deposit the SiC materials on either bare wafers or as part of the transistor device fabrication process.

PE2O8™

Technology and products

We have a proven track record of innovation, spanning a wide range of equipment and process technologies now used by the world’s leading semiconductor manufacturers.

  • Atomic Layer Deposition

    Industry-leading precision for ultrathin, conformal films critical to advanced logic, memory, and packaging, enabling angstrom-level control at scale. 

  • Epitaxy

    High-quality crystalline growth engineered for performance, yield, and ramp in advanced 3D architectures. 

  • PECVD

    Flexible dielectric deposition enabling low-temperature processing for advanced packaging and integration flows. 

  • Vertical furnaces

    Vertical furnaces offer very high productivity solutions for a wide range of thermal processes including low pressure chemical vapor deposition (LPCVD), diffusion and oxidation.

  • Service products

    Outcome-based services that improve uptime, yield, and performance in high-volume manufacturing.