Synergis® ALD
Synergis® is a high-productivity tool for a wide range of thermal ALD applications. The Synergis system can be configured with up to four Dual Chamber Modules (DCM), enabling eight chambers in high volume production, within a very compact footprint.
Major features
Synergis® is a high productivity 300mm tool for a wide range of thermal ALD applications.
Synergis ALD benefits
- Independent chambers for optimum single-wafer performance;
- Low volume chamber for efficient gas purge and fast processing;
- Precise thermal control for excellent conformality;
- Excellent chamber-to-chamber matching for wafer-to-wafer repeatability;
- Short preventative maintenance for high availability;
- Low cost per wafer.
Major applications
- Broad conformal film portfolio for metal oxides, dielectrics, metal nitrides, pure metals;
- Etch stops, hard masks;
- Low resistivity, ultra-thin barrier layers;
- Films for sealing and encapsulation;
- Low resistivity pure metals.